Transformation of SiOx films into nanocomposite SiO2(Si) films under thermal and laser annealing / Steblova, O. V., Evtukh, A. A., Bratus, O. L., Fedorenko, L. L., Voitovych, M. V., Lytvyn, O. S., Gavrylyuk, O. O., Semchuk, O. Yu. (2014)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000352938
Semiconductor Physics, Quantum Electronics and Optoelectronics    А - 2019 /  Issue (2014, Vol. 17, № 3)
Steblova O. V., Evtukh A. A., Bratus' O. L., Fedorenko L. L., Voitovych M. V., Lytvyn O. S., Gavrylyuk O. O., Semchuk O. Yu.
Transformation of SiOx films into nanocomposite SiO2(Si) films under thermal and laser annealing
Cite:
Steblova, O. V., Evtukh, A. A., Bratus, O. L., Fedorenko, L. L., Voitovych, M. V., Lytvyn, O. S., Gavrylyuk, O. O., Semchuk, O. Yu. (2014). Transformation of SiOx films into nanocomposite SiO2(Si) films under thermal and laser annealing. Semiconductor Physics, Quantum Electronics and Optoelectronics , 17 (3), 295-300. http://jnas.nbuv.gov.ua/article/UJRN-0000352938 | |
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