Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness / Bihun, R. I., Buchkovska, M. D., Stasiuk, Z. V., Leonov, D. S. (2013)
Ukrainian

English   Nanosystems, nanomaterials, nanotechnologies   /     Issue (2013, 11 (2))

Bihun R. I., Buchkovska M. D., Stasiuk Z. V., Leonov D. S.
Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness


Cite:
Bihun, R. I., Buchkovska, M. D., Stasiuk, Z. V., Leonov, D. S. (2013). Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness. Nanosystems, nanomaterials, nanotechnologies, 11 (2), 259-267. http://jnas.nbuv.gov.ua/article/UJRN-0000475583 [In Ukrainian].

 

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