On thermal stability of cryovacuum deposited CH4+H2O films / Aldiyarov, A., Sokolov, D., Akylbayeva, A., Nurmukan, A., Tokmoldin, N. (2020)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0001168655
Low Temperature Physics   А - 2019 /  Issue (2020, Т. 46, Вип. 11)
Aldiyarov A., Sokolov D., Akylbayeva A., Nurmukan А., Tokmoldin N.
On thermal stability of cryovacuum deposited CH4+H2O films
Cite:
Aldiyarov, A., Sokolov, D., Akylbayeva, A., Nurmukan, A., Tokmoldin, N. (2020). On thermal stability of cryovacuum deposited CH4+H2O films. Low Temperature Physics, 46 (11), 1318-1322. http://jnas.nbuv.gov.ua/article/UJRN-0001168655 | |
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