Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering / Popovych V. I., Ievtushenko A. I., Lytvyn O. S., Romanjuk V. R., Tkach V. M., Baturyn V. A., Karpenko O. Y., Dranchuk M. V., Klochkov L. O., Dushejko M. G., Karpyna V. A., Lashkarov G. V. (2016)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000727569
Ukrainian journal of physics   А - 2018 /  Випуск (2016, Vol. 61, № 4)
Popovych V. I., Ievtushenko A. I., Lytvyn O. S., Romanjuk V. R., Tkach V. M., Baturyn V. A., Karpenko O. Y., Dranchuk M. V., Klochkov L. O., Dushejko M. G., Karpyna V. A., Lashkarov G. V.
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering
Cite:
Popovych, V. I., Ievtushenko, A. I., Lytvyn, O. S., Romanjuk, V. R., Tkach, V. M., Baturyn, V. A., Karpenko, O. Y., Dranchuk, M. V., Klochkov, L. O., Dushejko, M. G., Karpyna, V. A., Lashkarov, G. V. (2016). Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering. Ukrainian journal of physics, 61 (4), 325-330. http://jnas.nbuv.gov.ua/article/UJRN-0000727569 | |
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