Tin-induced crystallization of amorphous silicon under pulsed laser irradiation / Neimash V. B., Melnyk V., Fedorenko L. L., Shepelyavyi P. Ye., Strilchuk V. V., Nikolenko A. S., Isaiev M. V., Kuzmych A. G. (2017)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000788271
Ukrainian journal of physics   А - 2018 /  Випуск (2017, Vol. 62, № 9)
Neimash V. B., Melnyk V., Fedorenko L. L., Shepelyavyi P. Ye., Strilchuk V. V., Nikolenko A. S., Isaiev M. V., Kuzmych A. G.
Tin-induced crystallization of amorphous silicon under pulsed laser irradiation
Cite:
Neimash, V. B., Melnyk, V., Fedorenko, L. L., Shepelyavyi, P. Ye., Strilchuk, V. V., Nikolenko, A. S., Isaiev, M. V., Kuzmych, A. G. (2017). Tin-induced crystallization of amorphous silicon under pulsed laser irradiation. Ukrainian journal of physics, 62 (9), 806-817. http://jnas.nbuv.gov.ua/article/UJRN-0000788271 | |
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