Theoretical study on laser annealing of non-stoichiometric SiOX films / Gavrylyuk, O. O. (2014)
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web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000282189
  Chemistry, physics and technology of surface    А - 2022  /     Issue (2014, Т. 5, № 4)

Gavrylyuk O. O.
Theoretical study on laser annealing of non-stoichiometric SiOX films

Cite:
Gavrylyuk, O. O. (2014). Theoretical study on laser annealing of non-stoichiometric SiOX films. Chemistry, physics and technology of surface, 5 (4), 461-466. http://jnas.nbuv.gov.ua/article/UJRN-0000282189

 

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