Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques / Brus, V. V., Kovalyuk, Z. D., Parfenyuk, O. A., Vakhnyak, N. D. (2011)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000349824 Semiconductor Physics, Quantum Electronics and Optoelectronics А - 2019 / Issue (2011, Vol. 14, № 4)
Brus V. V., Kovalyuk Z. D., Parfenyuk O. A., Vakhnyak N. D. Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
Cite: Brus, V. V., Kovalyuk, Z. D., Parfenyuk, O. A., Vakhnyak, N. D. (2011). Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques. Semiconductor Physics, Quantum Electronics and Optoelectronics , 14 (4), 427-431. http://jnas.nbuv.gov.ua/article/UJRN-0000349824 |
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