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Effect of pressure on the properties of Al SiO2 n-Si Ni structures / Vlasov, S. I., Ovsyannikov, A. V., Ismailov, B. K., Kuchkarov, B. H. (2012)
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 web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000350135 Semiconductor Physics, Quantum Electronics and Optoelectronics
      А  - 2019  /      Issue (2012,  Vol. 15, № 2) 
 Vlasov S. I., Ovsyannikov A. V., Ismailov B. K., Kuchkarov B. H.Effect of pressure on the properties of Al SiO2 n-Si Ni structures
 
 
 Cite:Vlasov, S. I., Ovsyannikov, A. V., Ismailov, B. K., Kuchkarov, B. H. (2012). Effect of pressure on the properties of Al SiO2 n-Si Ni structures. Semiconductor Physics, Quantum Electronics and Optoelectronics , 15 (2), 166-169. http://jnas.nbuv.gov.ua/article/UJRN-0000350135
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