Low-temperature deposition of silicon dioxide films in high-density plasma / Yasunas, A., Kotov, D., Shiripov, V., Radzionay, U. (2013)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000351896
Semiconductor Physics, Quantum Electronics and Optoelectronics    А - 2019 /  Issue (2013, Vol. 16, № 2)
Yasunas A., Kotov D., Shiripov V., Radzionay U.
Low-temperature deposition of silicon dioxide films in high-density plasma
Cite:
Yasunas, A., Kotov, D., Shiripov, V., Radzionay, U. (2013). Low-temperature deposition of silicon dioxide films in high-density plasma. Semiconductor Physics, Quantum Electronics and Optoelectronics , 16 (2), 216-219. http://jnas.nbuv.gov.ua/article/UJRN-0000351896 | |
|
|
PDF