Photostimulated reversible changes in the Ge-Se films as a base of resistive process / Babiichuk, I. V., Danko, V. A., Indutnyi, I. Z., Lukaniuk, M. V., Mynko, V. I., Shepeliavyi, P. Ye. (2014)
Ukrainian

English  Optoelectronics and Semiconductor Technique   /     Issue (2014, 49)

Babiichuk I. V., Danko V. A., Indutnyi I. Z., Lukaniuk M. V., Mynko V. I., Shepeliavyi P. Ye.
Photostimulated reversible changes in the Ge-Se films as a base of resistive process


Cite:
Babiichuk, I. V., Danko, V. A., Indutnyi, I. Z., Lukaniuk, M. V., Mynko, V. I., Shepeliavyi, P. Ye. (2014). Photostimulated reversible changes in the Ge-Se films as a base of resistive process. Optoelectronics and Semiconductor Technique, 49, 36-41. http://jnas.nbuv.gov.ua/article/UJRN-0000363504 [In Ukrainian].

 

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