The structural-phase composition in CoSb1,82-5,45 (30 nm)-SiO2 (100 nm)-Si (001) nanoscaled film compositions after deposition and annealings / Makogon, Ju. N., Pavlova, E. P., Sidorenko, S. I., Beddis, G., Daniel, M., Verbitskaja, T. I., Shkarban, R. A., Bogdanov, S. E. (2010)
Ukrainian

English  Modern Problems in Physical Materials Science   /     Issue (2010, 19)

Makogon Ju. N., Pavlova E. P., Sidorenko S. I., Beddis G., Daniel M., Verbitskaja T. I., Shkarban R. A., Bogdanov S. E.
The structural-phase composition in CoSb1,82-5,45 (30 nm)-SiO2 (100 nm)-Si (001) nanoscaled film compositions after deposition and annealings


Cite:
Makogon, Ju. N., Pavlova, E. P., Sidorenko, S. I., Beddis, G., Daniel, M., Verbitskaja, T. I., Shkarban, R. A., Bogdanov, S. E. (2010). The structural-phase composition in CoSb1,82-5,45 (30 nm)-SiO2 (100 nm)-Si (001) nanoscaled film compositions after deposition and annealings. Modern Problems in Physical Materials Science, 19, 68-75. http://jnas.nbuv.gov.ua/article/UJRN-0000640528 [In Russian].

 

Institute of Information Technologies of VNLU


+38 (044) 525-36-24
Ukraine, 03039, Kyiv, Holosiivskyi Ave, 3, room 209