Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures / Hladkovskiy, V. V., Fedorovich, O. A. (2017)
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web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000703424
  Ukrainian journal of physics      А - 2018  /     Issue (2017, Vol. 62, № 3)

Hladkovskiy V. V., Fedorovich O. A.
Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures

Cite:
Hladkovskiy, V. V., Fedorovich, O. A. (2017). Spectroscopic studies of RF discharge plasma at plasma-chemical etching of gallium nitride epitaxial structures. Ukrainian journal of physics, 62 (3), 208-213. http://jnas.nbuv.gov.ua/article/UJRN-0000703424

 

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