Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / Shapovalov, A. P., Korotash, I. V., Rudenko, E. M., Sizov, F. F., Dubyna, D. S., Osipov, L. S., Polotskiy, D. Yu., Tsybrii, Z. F., Korchovyi, A. A. (2015)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000706494
Semiconductor Physics, Quantum Electronics and Optoelectronics    А - 2019 /  Issue (2015, Vol. 18, № 2)
Shapovalov A. P., Korotash I. V., Rudenko E. M., Sizov F. F., Dubyna D. S., Osipov L. S., Polotskiy D. Yu., Tsybrii Z. F., Korchovyi A. A.
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Cite:
Shapovalov, A. P., Korotash, I. V., Rudenko, E. M., Sizov, F. F., Dubyna, D. S., Osipov, L. S., Polotskiy, D. Yu., Tsybrii, Z. F., Korchovyi, A. A. (2015). Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique. Semiconductor Physics, Quantum Electronics and Optoelectronics , 18 (2), 117-122. http://jnas.nbuv.gov.ua/article/UJRN-0000706494 | |
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