Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique / Shapovalov A. P., Korotash I. V., Rudenko E. M., Sizov F. F., Dubyna D. S., Osipov L. S., Polotskiy D. Yu., Tsybrii Z. F., Korchovyi A. A. (2015)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000706494
Semiconductor physics, quantum electronics & optoelectronics    А - 2019 /  Випуск (2015, Vol. 18, № 2)
Shapovalov A. P., Korotash I. V., Rudenko E. M., Sizov F. F., Dubyna D. S., Osipov L. S., Polotskiy D. Yu., Tsybrii Z. F., Korchovyi A. A.
Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique
Cite:
Shapovalov, A. P., Korotash, I. V., Rudenko, E. M., Sizov, F. F., Dubyna, D. S., Osipov, L. S., Polotskiy, D. Yu., Tsybrii, Z. F., Korchovyi, A. A. (2015). Structure and optical properties of AlN films obtained using the cathodic arc plasma deposition technique. Semiconductor Physics, Quantum Electronics and Optoelectronics , 18 (2), 117-122. http://jnas.nbuv.gov.ua/article/UJRN-0000706494 | |
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