Formation of nanocrystalline silicon in tin-doped amorphous silicon films / Rudenko, R. M., Voitsikhovska, O. O., Voitovych, V. V., Kolosiuk, A. H., Krasko, M. M., Povarchuk, V. Yu., Rudenko, M. P., Knorozok, L. M. (2020)
Ukrainian

English  Ukrainian Journal of Physics   /     Issue (2020, 65 (3))

Rudenko R. M., Voitsikhovska O. O., Voitovych V. V., Kolosiuk A. H., Krasko M. M., Povarchuk V. Yu., Rudenko M. P., Knorozok L. M.
Formation of nanocrystalline silicon in tin-doped amorphous silicon films


Cite:
Rudenko, R. M., Voitsikhovska, O. O., Voitovych, V. V., Kolosiuk, A. H., Krasko, M. M., Povarchuk, V. Yu., Rudenko, M. P., Knorozok, L. M. (2020). Formation of nanocrystalline silicon in tin-doped amorphous silicon films. Ukrainian Journal of Physics, 65 (3), 234-244. http://jnas.nbuv.gov.ua/article/UJRN-0001127979 [In Ukrainian].

 

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