Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target / Onoprienko, A. A., Ivashchenko, V. I., Kozak, A. O., Sinelnichenko, A. K., Tomila, T. V. (2019)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0001294418
Superhard Materials   А - 2019 /  Issue (2019, № 2)
Onoprienko A. A., Ivashchenko V. I., Kozak A. O., Sinelnichenko A. K., Tomila T. V.
Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target
Cite:
Onoprienko, A. A., Ivashchenko, V. I., Kozak, A. O., Sinelnichenko, A. K., Tomila, T. V. (2019). Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target. Superhard Materials, 2, 29-38. http://jnas.nbuv.gov.ua/article/UJRN-0001294418 | |
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