Formation of blisters in thin metal films on lithium niobate implanted by keV Ar+ ions / Lysiuk V. O., Moskalenko N. L., Staschuk V. S., Kluy M. I., Vakulenko O. V., Androsyuk I. G., Surmach M. A., Pogoda V. I. (2010)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000349136
Semiconductor physics, quantum electronics & optoelectronics    А - 2019 /  Випуск (2010, Vol. 13, № 1)
Lysiuk V. O., Moskalenko N. L., Staschuk V. S., Kluy M. I., Vakulenko O. V., Androsyuk I. G., Surmach M. A., Pogoda V. I.
Formation of blisters in thin metal films on lithium niobate implanted by keV Ar+ ions
Cite:
Lysiuk, V. O., Moskalenko, N. L., Staschuk, V. S., Kluy, M. I., Vakulenko, O. V., Androsyuk, I. G., Surmach, M. A., Pogoda, V. I. (2010). Formation of blisters in thin metal films on lithium niobate implanted by keV Ar+ ions. Semiconductor Physics, Quantum Electronics and Optoelectronics , 13 (1), 103-109. http://jnas.nbuv.gov.ua/article/UJRN-0000349136 | |
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