Влияние параметров ВЧ-разряда и параметров нагревателя на температуру подложки в плазмохимическом реакторе "Алмаз" для синтеза углеродных алмазоподобных пленок / Гладковский В. В., Костин Е. Г., Полозов Б. П., Федорович О. А., Петряков В. А. (2014)
|  Technology and design in electronic equipment /  Issue (2014, 5-6)
Gladkovskij V. V., Kostin E. G., Polozov B. P., Fedorovich O. A., Petrjakov V. A.
The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like carbon films
Cite:
Gladkovskij, V. V., Kostin, E. G., Polozov, B. P., Fedorovich, O. A., Petrjakov, V. A. (2014). The influence of HF discharge parameters and heater settings on the substrate temperature in the plasma-chemical reactor "Almaz" for the synthesis of diamond-like carbon films. Technology and design in electronic equipment, 5-6, 39-45. http://jnas.nbuv.gov.ua/article/UJRN-0000405303 [In Russian]. | |
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