External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process / Thongpan W., Kumpika T., Kantarak E., Panthawan A., Pooseekheaw P., Singjai P., Thongsuwan W., Tuantranont A. (2018)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000883392
Український фізичний журнал   А - 2018 /  Випуск (2018, Т. 63, № 6)
Thongpan W., Kumpika T., Kantarak E., Panthawan A., Pooseekheaw P., Singjai P., Thongsuwan W., Tuantranont A.
External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
Cite:
Thongpan, W., Kumpika, T., Kantarak, E., Panthawan, A., Pooseekheaw, P., Singjai, P., Thongsuwan, W., Tuantranont, A. (2018). External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process. Ukrainian Journal of Physics, 63 (6), 530-536. http://jnas.nbuv.gov.ua/article/UJRN-0000883392 | |
|
|
PDF