Theoretical evaluation of the temperature field distribution in the silicon periodic nanostructures during thermal annealing / Havryliuk, O. O., Semchuk, O. Yu. (2017)
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web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000687484
  Chemistry, physics and technology of surface    А - 2022  /     Issue (2017, Т. 8, № 1)

Havryliuk O. O., Semchuk О. Yu.
Theoretical evaluation of the temperature field distribution in the silicon periodic nanostructures during thermal annealing

Cite:
Havryliuk, O. O., Semchuk, O. Yu. (2017). Theoretical evaluation of the temperature field distribution in the silicon periodic nanostructures during thermal annealing. Chemistry, physics and technology of surface, 8 (1), 3-9. http://jnas.nbuv.gov.ua/article/UJRN-0000687484

 

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