Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering / Myroniuk, D. V., Ievtushenko, A. I., Lashkarev, G. V., Maslyuk, V. T., Timofeeva, I. I., Baturin, V. A., Karpenko, O. Y., Kuznetsov, V. M., Dranchuk, M. V. (2015)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000714275
Semiconductor Physics, Quantum Electronics and Optoelectronics    А - 2019 /  Issue (2015, Vol. 18, № 3)
Myroniuk D. V., Ievtushenko A. I., Lashkarev G. V., Maslyuk V. T., Timofeeva I. I., Baturin V. A., Karpenko O. Y., Kuznetsov V. M., Dranchuk M. V.
Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering
Cite:
Myroniuk, D. V., Ievtushenko, A. I., Lashkarev, G. V., Maslyuk, V. T., Timofeeva, I. I., Baturin, V. A., Karpenko, O. Y., Kuznetsov, V. M., Dranchuk, M. V. (2015). Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering. Semiconductor Physics, Quantum Electronics and Optoelectronics , 18 (3), 286-291. http://jnas.nbuv.gov.ua/article/UJRN-0000714275 | |
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