Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering / Myroniuk D. V., Ievtushenko A. I., Lashkarev G. V., Maslyuk V. T., Timofeeva I. I., Baturin V. A., Karpenko O. Y., Kuznetsov V. M., Dranchuk M. V. (2015)
інтернет-адреса сторінки: http://jnas.nbuv.gov.ua/article/UJRN-0000714275
Semiconductor physics quantum electronics & optoelectronics    А - 2019 /  Випуск (2015, Vol. 18, № 3)
Myroniuk D. V., Ievtushenko A. I., Lashkarev G. V., Maslyuk V. T., Timofeeva I. I., Baturin V. A., Karpenko O. Y., Kuznetsov V. M., Dranchuk M. V.
Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering
Cite:
Myroniuk, D. V., Ievtushenko, A. I., Lashkarev, G. V., Maslyuk, V. T., Timofeeva, I. I., Baturin, V. A., Karpenko, O. Y., Kuznetsov, V. M., Dranchuk, M. V. (2015). Effect of electron irradiation on transparent conductive films ZnO:Al deposited at different power sputtering. Semiconductor Physics, Quantum Electronics and Optoelectronics , 18 (3), 286-291. http://jnas.nbuv.gov.ua/article/UJRN-0000714275 | |
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