Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing / Gavrylyuk, O. O., Semchuk, O. Yu., Steblova, O. V., Evtukh, A. A., Fedorenko, L. L. (2014)
web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000726343
Ukrainian Journal of Physics   А - 2018 /  Issue (2014, Т. 59, № 7)
Gavrylyuk O. O., Semchuk O. Yu., Steblova O. V., Evtukh A. A., Fedorenko L. L.
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
Cite:
Gavrylyuk, O. O., Semchuk, O. Yu., Steblova, O. V., Evtukh, A. A., Fedorenko, L. L. (2014). Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing. Ukrainian Journal of Physics, 59 (7), 712-718. http://jnas.nbuv.gov.ua/article/UJRN-0000726343 | |
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