Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering / Popovych, V. I., Yevtushenko, A. I., Lytvyn, O. S., Romaniuk, V. R., Tkach, V. M., Baturyn, V. A., Karpenko, O. Ye., Dranchuk, M. V., Klochkov, L. O., Dusheiko, M. H., Karpyna, V. A., Lashkarov, H. V. (2016)
Ukrainian

English  Ukrainian Journal of Physics   /     Issue (2016, 61 (4))

Popovych V. I., Yevtushenko A. I., Lytvyn O. S., Romaniuk V. R., Tkach V. M., Baturyn V. A., Karpenko O. Ye., Dranchuk M. V., Klochkov L. O., Dusheiko M. H., Karpyna V. A., Lashkarov H. V.
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering


Cite:
Popovych, V. I., Yevtushenko, A. I., Lytvyn, O. S., Romaniuk, V. R., Tkach, V. M., Baturyn, V. A., Karpenko, O. Ye., Dranchuk, M. V., Klochkov, L. O., Dusheiko, M. H., Karpyna, V. A., Lashkarov, H. V. (2016). Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering. Ukrainian Journal of Physics, 61 (4), 334-339. http://jnas.nbuv.gov.ua/article/UJRN-0000732262 [In Ukrainian].

 

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