Plasma potential influence on ion energy istribution function in icp source / Vozniy, O. V., Yeom, G. Y., Kropotov, A. Yu. (2007)
UkrainianEnglish

web address of the page http://jnas.nbuv.gov.ua/article/UJRN-0000858403
  Physical surface engineering   /     Issue (2007, Т. 5, № 1-2)

Vozniy O. V., Yeom G. Y., Kropotov A. Yu.
Plasma potential influence on ion energy istribution function in icp source

Cite:
Vozniy, O. V., Yeom, G. Y., Kropotov, A. Yu. (2007). Plasma potential influence on ion energy istribution function in icp source. Physical surface engineering, 5 (1-2), 28-33. http://jnas.nbuv.gov.ua/article/UJRN-0000858403

 

Institute of Information Technologies of VNLU

+38 (044) 525-36-24
libnas@nbuv.gov.ua
Ukraine, 03039, Kyiv, Holosiivskyi Ave, 3, room 209