Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures / Dudin, S. V. (2009)
Ukrainian

English  Physical surface engineering   /     Issue (2009, 7 (3))

Dudin S. V.
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures


Cite:
Dudin, S. V. (2009). Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures. Physical surface engineering, 7 (3), 171-194. http://jnas.nbuv.gov.ua/article/UJRN-0000872969 [In Russian].

 

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